Magnesium Nickel Cobalt Alloy Micropowder

Product Name : Magnesium Nickel Cobalt Alloy Micropowder

Our specializes in producing high purityMagnesium Nickel Cobalt Alloy Sputtering Targets with the highest possibledensity High Purity (99.99%) Magnesium Nickel Cobalt Alloy Sputtering Targetandsmallest possible average grain sizes for use in hydrogen storage, chemicalvapor deposition (CVD) and physical vapor deposition (PVD) display and opticalapplications. Our standard sputtering targets for thin film deposition areavailable monoblock or bonded with planar target dimensions and configurationsup to 820 mm with hole drill locations and threading, beveling, grooves andbacking designed to work with both older sputtering devices as well as thelatest process equipment, such as large area coating for solar energy or fuelcells and flip-chip applications. Rotary (cylindrical), round, rectangular,square, ring, annular, oval, "dog-bone" and other shaped targets areavailable in standard, custom, and research sized dimensions.

CasNo:                       N/A    

Appearance                 Powder

APS                             1-5µm (Can be Customized)

Purity                          ‰99%

Chemicalformula：    Mg/Ni/Co

Molarmass：              141.932

Density：                    N/A

Solubilityin H2O:       N/A

Usage/Application      : Scientific Research

Related Information :

Storage Conditions:

Airtight sealed, avoid light, and keep dry atroom temperature.

Suggest Equipment

Eyeshields, Gloves, type N95 (US), type P1(EN143) Respirator Filter